Technology

We use a specialist coating system to apply a photo-resist to the back-contact of the pre-lamination lay-up photovoltaic modules. The photo-resist is cured by exposing to ultraviolet (UV) light through a pre-defined mask or artwork of the desired end pattern or designs. The panels are then processed through an integrated horizontal wet-process line which sequentially removes the uncured photoresist, etches the back-contact & photovoltaic absorber layers and finally removes the cured photo-resist from the whole panel.

Our equipment providers have standard production variants that are capable of 2500-3500mm conveyor widths and hence the ability to process glass sub-modules, from all the major thin-film silicon photovoltaic manufacturing systems, including the current largest based on either GEN 8.5 or GEN 10 technology.

The integrated wet processes equipment can operate at conveyor speeds upto 5.0M/min, thus providing a maximum productivity rate of approximately 25,000 sq.metres (based on GEN 8.5 system) to be processed daily, in 24 hour operation, allowing time for scheduled employee breaks and routine line maintenance.

Our patent pending process is very direct, uncomplicated and entirely acceptable from both a safety and environmental perspective, unlike all previous attempts at patterning of thin-film silicon photovoltaic coatings by photo-lithography which required the use of toxic & dangerous materials or processes. Our technology is able to provide large area photovoltaic modules with fine or custom patterns, of high optical clarity at lower cost and with higher productivity.